Clean Room

For the lithographic preparation of thin film devices and sensors since end of 2005 the institute has constructed a cleanroom of class 100 at the workbenches and of class 10 000 in areas of equipment. The cleanroom will get direct access to the thin film laboratory by vacuum locks to exchange samples between thin deposition and plasma etching in the lab and lithography in the cleanroom area.

In the cleanroom the Zeiss SEM for electron-beam lithography, both Suess maskaligners for optical lithography and a cleanbench with spin coater, heater, deionized water bath and temperature controlled ultrasound cleaning equipment are situated.